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Laurell WS-400B-6NPP-Lite Manual Spinners

The manual spinners are used for spin coating photoresist onto wafers. Chucks are available for 2", 4", and 6" wafers and small wafer fragments. Maximum speed is 8000 rpm.

You may operate the spinner without going through a formal checkout procedure. However, you are required to read the SOP carefully, and arrange with a qualified lab user to demonstrate tool use to you before using it by yourself.

There is one "clean" spinner which may be used only with SPR series resists. The "dirty" spinner may be used with other materials such as SU-8, polyimide, and biopolymers.

Contacts: Robert White, Jim Vlahakis

Related Standard Operating Procedures: